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ICP-AES Method Development & System Proficiency Training
Following our proficient on-site engagement, your staff won't just be certified; They will be advanced operators, fully equipped with the knowledge and confidence that guarantee the continuity of your lab's high-performance operation.

Module 1: AAS Fundamentals and Instrumentation
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Principles of atomic emission
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Understanding the excitation and emission process
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Theory of the Inductively Coupled Plasma (ICP): generating the argon plasma
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Comparison of ICP-AES to ICP-MS: detection limits, linear range, and major vs. trace analysis
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ICP-OES instrument components
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Detailed function of the sample introduction system
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Torch configurations: Radial vs. Axial viewing and when to use each
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The spectrometer: function of the echelle optics and grating
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Detectors: understanding CCD/CMOS array detectors and data collection
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Basic operation and startup
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Proper argon gas management and plasma ignition procedures
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Software familiarisation and wavelength calibration procedures
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Daily System Suitability Tests (SST) using a multi-element check standard
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Module 2: Advanced Method Development & Interference Management
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Wavelength Selection
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Select primary, secondary, and tertiary lines using software based on sensitivity and interferences
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Master Background Correction points (online/offline)
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Spectral Interference Correction
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Identify and correct spectral overlap (e.g., from matrix elements)
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Apply Inter-Element Correction (IEC) factors and Factor Analysis Correction Technique (FACT) for complex matrices
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Non-Spectral (Matrix) Interferences
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Address Physical Interferences and Chemical Interferences
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Mitigate effects using ionization buffers and proper plasma power adjustment
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Method Optimization
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Optimize RF power and gas flow for a "robust" plasma (Mg II/Mg I ratio)
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Calibration and Quantitation
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Prepare multi-point curves and use Internal Standards for drift correction
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Determine accurate Detection Limits (DLs) and Quantitation Limits (LOQ)
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Module 3: Validation, Compliance & Data Integrity
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ICP-OES Method Validation
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Define and determine key validation parameters: Detection Limits (DLs), Limit of Quantitation (LOQ), and Working Range
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Establish Precision and Accuracy criteria for major vs. trace elements
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Calibration and Quality Control
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Prepare multi-point Calibration Curves and manage non-linearity
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Ensure proper use of Internal Standards to correct for drift and physical interferences
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Design a comprehensive Quality Control (QC) sequence (Blanks, Spikes, Duplicates).
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Sustained Compliance Systems
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Implement Standard Operating Procedures (SOPs) for OES-specific checks
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Establish a formal process for Out-of-Specification (OOS) results and corrective action
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Module 4: System Maintenance and Advanced Troubleshooting
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Preventative Maintenance (PM)
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Scheduled maintenance for the sample introduction system (nebulizer, pump tubing, torch cleaning)
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Spectrometer Maintenance: Purge gas management and optics window cleaning
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Advanced Troubleshooting Logic
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Systematic diagnosis of common issues: Low Signal and Poor Precision - Utilizing Mg II/Mg I ratio and Cu/Mn drift checks for system health
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Identifying the root cause of issues: sample introduction, plasma, or spectrometer failure
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Training syllabus
This course delivers expertise in ICP-AES System Proficiency and robust method development. You will gain practical skills to ensure guaranteed compliance and data integrity, alongside advanced maintenance and troubleshooting for sustained, high-quality performance.
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