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ICP-AES

Home - ICP-AES

ICP-AES Method Development & System Proficiency Training

Following our proficient on-site engagement, your staff won't just be certified; They will be advanced operators, fully equipped with the knowledge and confidence that guarantee the continuity of your lab's high-performance operation.​

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Module 1:  AAS Fundamentals and Instrumentation
  • Principles of atomic emission

    • Understanding the excitation and emission process

    • Theory of the Inductively Coupled Plasma (ICP): generating the argon plasma

    • Comparison of ICP-AES to ICP-MS: detection limits, linear range, and major vs. trace analysis

  • ICP-OES instrument components

    • Detailed function of the sample introduction system

    • Torch configurations: Radial vs. Axial viewing and when to use each

    • The spectrometer: function of the echelle optics and grating

    • Detectors: understanding CCD/CMOS array detectors and data collection

  • Basic operation and startup

    • Proper argon gas management and plasma ignition procedures

    • Software familiarisation and wavelength calibration procedures

    • Daily System Suitability Tests (SST) using a multi-element check standard

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Module 2: Advanced Method Development & Interference Management
  • Wavelength Selection

    • ​ Select primary, secondary, and tertiary lines using software based on sensitivity and interferences

    • Master Background Correction points (online/offline)

  • Spectral Interference Correction

    • Identify and correct spectral overlap (e.g., from matrix elements)

    • Apply Inter-Element Correction (IEC) factors and Factor Analysis Correction Technique (FACT) for complex matrices

  • Non-Spectral (Matrix) Interferences

    • Address Physical Interferences and Chemical Interferences 

    • Mitigate effects using ionization buffers and proper plasma power adjustment

  • Method Optimization

    • Optimize RF power and gas flow for a "robust" plasma (Mg II/Mg I ratio)

  • Calibration and Quantitation

    • Prepare multi-point curves and use Internal Standards for drift correction

    • Determine accurate Detection Limits (DLs) and Quantitation Limits (LOQ)

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Module 3: Validation, Compliance & Data Integrity 
  • ICP-OES Method Validation

    • Define and determine key validation parameters: Detection Limits (DLs), Limit of Quantitation (LOQ), and Working Range

    • Establish Precision and Accuracy criteria for major vs. trace elements

  • Calibration and Quality Control

    • Prepare multi-point Calibration Curves and manage non-linearity

    • Ensure proper use of Internal Standards to correct for drift and physical interferences

    • Design a comprehensive Quality Control (QC) sequence (Blanks, Spikes, Duplicates).

  • Sustained Compliance Systems 

    • Implement Standard Operating Procedures (SOPs) for OES-specific checks

    • Establish a formal process for Out-of-Specification (OOS) results and corrective action

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Module 4: System Maintenance and Advanced Troubleshooting
  • Preventative Maintenance (PM)

    • Scheduled maintenance for the sample introduction system (nebulizer, pump tubing, torch cleaning)

    • Spectrometer Maintenance: Purge gas management and optics window cleaning

  • Advanced Troubleshooting Logic

    • Systematic diagnosis of common issues: Low Signal and Poor Precision - Utilizing Mg II/Mg I ratio and Cu/Mn drift checks for system health

    • Identifying the root cause of issues: sample introduction, plasma, or spectrometer failure

Training syllabus

This course delivers expertise in ICP-AES System Proficiency and robust method development. You will gain practical skills to ensure guaranteed compliance and data integrity, alongside advanced maintenance and troubleshooting for sustained, high-quality performance.

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